For photon-based maskless lithography we show that a system based on the incoherent addition of scanned, multiplexed, and on-axis focal spots from an array of diffractive-optical elements, such as binary-phase zone plates, has significant advantages over systems based on partially coherent projection of the image of a micromechanical mirror array through a large refractive or reflective lens. We show that zone-plate arrays with. numerical apertures up to 0.9 can be manufactured with near-ideal performance, and used to achieve high-quality lithography of arbitrary patterns. Using a wavelength of 400 nm we demonstrate k(1), factors as low as 0.32, without the use of any resolution-enhancement techniques; that sufficient contrast is achieved in dense patterns despite the presence of diffracted orders other than +1; and that a process-latitude greater than 10% is achieved for 150 nm lines and spaces. Advantages of our diffractive-optical approach include: the feasibility of wave-front engineering by using elements other than binary-phase zone plates; the simplicity of the processes needed to manufacture large arrays of high-numerical-aperture diffractive-optical elements; and the ease of wavelength scaling, with the promise of ultimately approaching the limits of the lithographic process. (C) 2003 American Vacuum Society.