수정진동자를 이용한 Al의 전기화학적 부식에 관한 연구

조홍식; 이행자; 최광재; 김종민; 김영한; 장상목; Hong-Sig Cho; Haeng-Ja Lee; Kwong-Jae Choi; Jong-Min Kim; Young-Han Kim; Sang-Mok Chang

HWAHAK KONGHAK, Vol.38, No.2, 160-165, April, 2000

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수정진동자를 이용한 Al의 전기화학적 부식에 관한 연구

Study of Electrochemical Corrosion of Al Using Quartz Crystal

조홍식, 이행자, 최광재, 김종민¹, 김영한 , 장상목 ^†

동아대학교 공과대학 화학공학과, 부산 604-714
¹Seiko 첨단기술연구소, Matsudo-shi, Chiba 270-2222

Hong-Sig Cho, Haeng-Ja Lee, Kwong-Jae Choi, Jong-Min Kim¹, Young-Han Kim , and Sang-Mok Chang^†

Dept. of Chem. Eng., Dong-A Univ., Pusan 604-714, Korea
¹Advanced Technology Center, SEIKO Instruments Inc., Matsudo-shi, Chiba 270-2222, Japan

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초록

0.1M NaCl 전해질 용액과 수정진동자를 사용하여 알루미늄 표면의 전기화학적 부식의 동특성을 검토하였다. 정전위법을 사용하여 부식을 진행시킴과 동시에 수정진동자의 공진주파수와 공진저항 그리고 전류 응답을 연속적으로 측정하였다. 또한 표면 형상의 변화를 원자간력 현미경을 사용하여 관찰하였고 표면 성분을 EDX를 사용하여 분석하여, 비교 검토하였다. 실험의 결과, 공진주파수와 공진저항의 동시 측정하여 분석함으로서 부식 과정에 있어서 야기되는 표면 형상 구조의 변화를 유추할 수 있었다.

A quartz crystal analyzer is utilized to monitor the corrosion process of an aluminum surface of a quartz crystal in 0.1M NaCl electrolyte solution. While a constant potential is applied to the cell, the resonant frequency and resonant resistance and response of current are simultaneously measured using the quartz crystal analyzer. In addition, the surface morphology is taken with an atomic force microscopy(AFM) and the element analysis of the surface is conducted using an energy dispersive X-ray spectrometer(EDX). The simultaneous measurement of resonant frequency, resonant resistance and response of current during the corrosion process explains the change of surface structure caused by the corrosion.

Keywords:Quartz Crystal;Al;Corrosion;AFM;EDX

[References]

Lossew WW, Electrochim. Acta, 8, 387 (1963)
Kivel J, Isotope Radiation Technol., 5, 112 (1967)
Borie BS, Sparks CJ, Cathcart JV, Acta Mett., 10, 691 (1962)
Aoyama Y, Sci. Pap. I.P.C.R., 60, 69 (1966)
"Handbook of Metal Anticorrosion Technology," Gijeonyeongusa, 59 (1993)
Kim JM, Chang SM, Suda Y, Muramatsu H, Sens. Actuators A-Phys., 72(2), 140 (1999)
Shons H, Dorman F, Najarian J, J. Biomed. Res., 6, 565 (1972)
Muramatsu H, Dicks JM, Tamiya E, Karube I, Anal. Chem., 59, 2760 (1987)
Chang SM, Kim JM, Muramatsu H, Ataka T, Cho WJ, Ha CS, Polymer, 37(16), 3757 (1996)
Kim JM, Chang SM, Muramatsu H, Polymer, 40(12), 3291 (1999)
Kim JM, Chang SM, Lee HW, Kwon YS, Oh YH, Synth. Met., 85, 1371 (1997)
Bruckenstein S, Shay M, J. Electroanal. Chem., 188, 131 (1985)
Kim JM, Jang SM, Muramatsu H, Appl. Phys. Lett., 74(3) (1999)
Nomura T, Iijima M, Anal. Chim. Acta, 131, 97 (1981)
Muramatsu H, Suda M, Ataka T, Seki A, Tamiya E, Karube I, Sens. Actuators A-Phys., 21-23, 362 (1990)
Ye X, Muramatsu H, Kimura K, Sakuhara T, Ataka T, J. Electroanal. Chem., 314, 279 (1991)
Muramatsu H, Tamiya E, Karube I, Anal. Chim. Acta, 251, 135 (1991)
Muramatsu H, Ye X, Suda M, Sakuhara T, Ataka T, J. Electroanal. Chem., 322, 311 (1992)
Nisancioglu K, Danvanger KY, Strandmyr O, Electrochem. Sci. Tech., 128, 1523 (1981)
Davis GD, Shaw BA, Rees BJ, Principle EL, Pecile CA, Iyengar AS, Tech. rep., Martin Marietta Lab., MML TR 94-04 (1993)
Kanazawa KK, Gordon JG, Anal. Chim. Acta, 175, 99 (1985)
Muramatsu H, Tamiya E, Karube I, Anal. Chem., 60, 2142 (1988)
Naoi K, Mori M, Denki Kagaku, 65, 4 (1997)

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[1] Lossew WW, Electrochim. Acta, 8, 387 (1963)

[2] Kivel J, Isotope Radiation Technol., 5, 112 (1967)

[3] Borie BS, Sparks CJ, Cathcart JV, Acta Mett., 10, 691 (1962)

[4] Aoyama Y, Sci. Pap. I.P.C.R., 60, 69 (1966)

[5] "Handbook of Metal Anticorrosion Technology," Gijeonyeongusa, 59 (1993)

[6] Kim JM, Chang SM, Suda Y, Muramatsu H, Sens. Actuators A-Phys., 72(2), 140 (1999)

[7] Shons H, Dorman F, Najarian J, J. Biomed. Res., 6, 565 (1972)

[8] Muramatsu H, Dicks JM, Tamiya E, Karube I, Anal. Chem., 59, 2760 (1987)

[9] Chang SM, Kim JM, Muramatsu H, Ataka T, Cho WJ, Ha CS, Polymer, 37(16), 3757 (1996)

[10] Kim JM, Chang SM, Muramatsu H, Polymer, 40(12), 3291 (1999)

[11] Kim JM, Chang SM, Lee HW, Kwon YS, Oh YH, Synth. Met., 85, 1371 (1997)

[12] Bruckenstein S, Shay M, J. Electroanal. Chem., 188, 131 (1985)

[13] Kim JM, Jang SM, Muramatsu H, Appl. Phys. Lett., 74(3) (1999)

[14] Nomura T, Iijima M, Anal. Chim. Acta, 131, 97 (1981)

[15] Muramatsu H, Suda M, Ataka T, Seki A, Tamiya E, Karube I, Sens. Actuators A-Phys., 21-23, 362 (1990)

[16] Ye X, Muramatsu H, Kimura K, Sakuhara T, Ataka T, J. Electroanal. Chem., 314, 279 (1991)

[17] Muramatsu H, Tamiya E, Karube I, Anal. Chim. Acta, 251, 135 (1991)

[18] Muramatsu H, Ye X, Suda M, Sakuhara T, Ataka T, J. Electroanal. Chem., 322, 311 (1992)

[19] Nisancioglu K, Danvanger KY, Strandmyr O, Electrochem. Sci. Tech., 128, 1523 (1981)

[20] Davis GD, Shaw BA, Rees BJ, Principle EL, Pecile CA, Iyengar AS, Tech. rep., Martin Marietta Lab., MML TR 94-04 (1993)

[21] Kanazawa KK, Gordon JG, Anal. Chim. Acta, 175, 99 (1985)

[22] Muramatsu H, Tamiya E, Karube I, Anal. Chem., 60, 2142 (1988)

[23] Naoi K, Mori M, Denki Kagaku, 65, 4 (1997)