In this article we determine physical parameters characterizing the ionized physical vapor deposition of titanium in a Hollow Cathode Magnetron by comparing experimental results obtained from suitable submicron test structures with a multiscale model. The model includes the reactor scale, the plasma sheath and presheath scale, and the feature scale. The reactor scale model delivers the energy and angular distribution of the neutral sputtered particles from the reactor geometry and an energy dependent collision model. The sheath and presheath model calculates the energy and angular distribution of the ions from the reactor model and a subsequent scattering model describes collisions in the presence of magnetic fields. The levelset-based feature scale simulator propagates the front according to local growth velocities which are calculated from Monte Carlo particle flux and reaction kinetics (derived from molecular dynamics calculation). The calibration is performed in two steps with help from bottle-shaped test structures as well as technologically relevant structures. First, hi-fill and ultra-hi-fill magnetron sputter processes of titanium are investigated in order to verify the transport model for the neutral particles. Second, a Hollow Cathode Magnetron sputter process of titanium is analyzed in order to verify the transport model for postionized particles. This analysis is performed for a floating substrate process and a process with rf-driven substrate bias. The postionized flux fraction of titanium in this technology is not calculated from a plasma model but treated as a free parameter. The prediction of the model and the comparison with the experimental data allow us to determine this value as 0.7+/-0.1 under a standard condition. The ionized flux of argon relative to the ionized flux of titanium is determined as 2. The results show that the bottom and sidewall coverage of the process depends significantly on the angular dependence of the ionized component which is essentially a result of processes in the presheath. The validity of the model covers a variety of plasma and process conditions. It can be applied to other reactor concepts and materials. (C) 2003 American Vacuum Society.