Journal of Vacuum Science & Technology A, Vol.21, No.4, 994-1003, 2003
Thermal plasma fabricated lithium niobate-tantalate films on sapphire substrate
We report the deposition of LiNb1-xTaxO3 (0less than or equal toXless than or equal to1) films on (00 1) sapphire substrates in soft vacuum using a radio frequency thermal plasma. The growth rate, crystallinity, c-axis orientation, and surface roughness were examined as functions of substrate temperature, precursor feed rate, and substrate surface condition. The film Nb/Ta ratio was well controlled by using an appropriate uniform mixture of lithium-niobium and lithium-tantalum alkoxide solutions. The epitaxy and crystallinity of the films were much improved when the film growth rate was raised from 20 to 180-380 nm/min, where the films with the (006) rocking curve full width at half maximum values as low as 0.12degrees-0.2degrees could be produced. The film roughness could be reduced by using a liquid precursor with higher metal concentrations, achieving the root-mean-square value on the order of 5 nm. The refractive indices of the films are in good correspondence with their composition and crystallinity. (C) 2003 American Vacuum Society.