Plasma materials processing for microelectronics fabrication, formerly an empirical technology, has in recent years greatly benefited from the use of modeling and simulation (MS) for equipment and process design: The maturation of plasma equipment and feature scale MS has resulted from a better understanding of the underlying physics and chemistry, from innovation in numerical algorithms and in the development of a more comprehensive fundamental,database. A summary is presented of the historical development, present status and future potential of MS for feature evolution and plasma reactor design. (C) 2003 American Vacuum Society.