Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology A, Vol.22, No.2, 441-441, 2004 DOI10.1116/1.1642652 Export Citation Etch characteristics of CeO2 thin film in Ar/CF4/Cl-2 plasma (vol 21, pg 426, 2003) Kim DP, Chang YS, Kim CI Please enable JavaScript to view the comments powered by Disqus.
