원자외선에 의한 자기조립 단분자막의 서브마이크론 패턴 제작과 이를 이용한 생물 포토다이오드의 어레이 제작에 관한 연구

지항석; 최형석; 박제균; 오세용; Hang Sok Jie; Huung Seok Choi; Je Kyun Park; Se Young Oh

Journal of the Korean Industrial and Engineering Chemistry, Vol.15, No.7, 803-807, November, 2004

Export Citation

원자외선에 의한 자기조립 단분자막의 서브마이크론 패턴 제작과 이를 이용한 생물 포토다이오드의 어레이 제작에 관한 연구

Submicron Patterning of Self-assembled Monolayer with a Deep UV Light and Fabrication of Biomolecular Photodiode Array

지항석, 최형석, 박제균¹, 오세용 ^†

서강대학교 공과대학 화공생명공학과, 서울 121-742
¹한국과학기술원 공학부 바이오시스템학과, 대전 305-701

Hang Sok Jie, Huung Seok Choi, Je Kyun Park¹, and Se Young Oh^†

Department of Chemical & Biomolecular Engineering, Sogang University, Seoul 121-742, Korea
¹Department of Biosystems, Korea Advanced Institute of Science and Technology, Daejeon 305-701, Korea

E-mail:

초록

원자외선을 가지고 패턴을 형성한 11-mercaptoundecanoic acid(11-MUDA) 자기조립 단분자막을 사용하여 생물 전자소자를 제작하였다. 금 기판에 11-MUDA 분자를 흡착시키고 700 nm의 크기를 갖는 네거티브형 마스크를 이용하여 원자외선으로 조사한 후 deionized water를 사용하여 현상하였다. Cytochrome c와 GFP 단백질의 복합층은 패턴이 형성된 11-MUDA 자기 조립 단분자막 위에 고정화시켜 제작하였다. Cytochrome c 단층막의 전기화학적 특성과 표면특성은 cyclicvoltammetry와 AFM을 사용하여 조사하였고 cytochrome c와 GFP 다층막의 정류 특성은 STM을 사용하여 측정분석하였다.

We fabricated a bioelectronic device using 11-mercapto undecanoic acid (11-MUDA) self-assembled monolayer (SAM) patterned with a deep UV light. Alkanethiolate SAM formed by the adsorption of 11-MUDA molecules on a gold substrate. The 11-MUDA SAM was oxidized thru the irradiation of deep UV light with a 700 nm negative mask and then developed with deionized water. Cytochrome c and GFP multilayers were immobilized onto the patterned 11-MUDA molecules. Electrochemical properties and surface morphology of the cytochrome c monolayer were investigated through the mea surements of cyclicvoltammetry and AFM. In addition, the rectifying characteristics of cytochrome c and GFP multilayers were studied with a scanning tunneling microscope (STM).

Keywords:self-assembled monolayer;photopatterning;cytochrome c and GFP multilayers;electrical property;rectifying characteristics

[References]

Ulman A, Thin Films, Self-Assembled Monolayer of Thiols, Academic Press, San Diego (1998)
Ulman A, Chem. Rev., 96(4), 1533 (1996)
Ulman A, An Introduction to Ultrathin Organic Films, Langmuir Blodgett to Self-Assembly, Harcourt Brace & Co., Boston (1991)
Carr DW, Lercel MJ, Whelan CS, Craighead HG, Seshadri K, Allara Dl, J. Vac. Sci. Technol., A15, 1446 (1997)
Kumar A, Whitesides GM, Science, 263(5143), 60 (1994)
Suh D, Simons JK, Taylor JW, Koloski TS, Calvert JM, J. Vac. Sci. Technol., B11, 2850 (1993)
Xia Y, Zhao XM, Kim E, Whitesides GM, Chem. Mater., 7, 2332 (1995)
Zhao XM, Wilbur JL, Whitesides GM, Langmuir, 12(13), 3257 (1996)
Brewer NJ, Rawsterne RE, Kothari S, Leggett GJ, J. Am. Chem. Soc., 123(17), 4089 (2001)
Cooper E, Leggett GJ, Langmuir, 14(17), 4795 (1998)
Oh SY, Jie HS, Choi HS, Choi JW, J. Nanosic., 1, 611 (2002)
Oh SY, Park JK, Chung CM, Choi JW, Opt. Mater., 21, 265 (2002)

[Related Articles]

[1] Ulman A, Thin Films, Self-Assembled Monolayer of Thiols, Academic Press, San Diego (1998)

[2] Ulman A, Chem. Rev., 96(4), 1533 (1996)

[3] Ulman A, An Introduction to Ultrathin Organic Films, Langmuir Blodgett to Self-Assembly, Harcourt Brace & Co., Boston (1991)

[4] Carr DW, Lercel MJ, Whelan CS, Craighead HG, Seshadri K, Allara Dl, J. Vac. Sci. Technol., A15, 1446 (1997)

[5] Kumar A, Whitesides GM, Science, 263(5143), 60 (1994)

[6] Suh D, Simons JK, Taylor JW, Koloski TS, Calvert JM, J. Vac. Sci. Technol., B11, 2850 (1993)

[7] Xia Y, Zhao XM, Kim E, Whitesides GM, Chem. Mater., 7, 2332 (1995)

[8] Zhao XM, Wilbur JL, Whitesides GM, Langmuir, 12(13), 3257 (1996)

[9] Brewer NJ, Rawsterne RE, Kothari S, Leggett GJ, J. Am. Chem. Soc., 123(17), 4089 (2001)

[10] Cooper E, Leggett GJ, Langmuir, 14(17), 4795 (1998)

[11] Oh SY, Jie HS, Choi HS, Choi JW, J. Nanosic., 1, 611 (2002)

[12] Oh SY, Park JK, Chung CM, Choi JW, Opt. Mater., 21, 265 (2002)