Patterned Fluorescence Images with a t-Boc-Protected Coumarin Derivative

Sung-Jun Min; Bum Jun Park; Jong-Man Kim

Macromolecular Research, Vol.12, No.6, 615-617, December, 2004

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Patterned Fluorescence Images with a t-Boc-Protected Coumarin Derivative

Sung-Jun Min, Bum Jun Park, and Jong-Man Kim^†

Department of Chemical Engineering, Hanyang University, 17 Haengdang, Seongdong, Seoul 133-791, Korea

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We have developed an efficient method for the generation of patterned fluorescence images using a protected precursor molecule. The t-Boc-protecting group of a coumarin derivative was readily removed from a polymer film upon irradiation with UV light in the presence of a photoacid generator to provide the original properties of the coumarin. Fine fluorescence patterns were obtained when using this photolithographic method.

Keywords:fluorescent image;polymer film;precursor

[References]

Vekselman AM, Zhang C, Darling GD, Chem. Mater., 9, 1942 (1997)
Schilling ML, Katz HE, Houlihan FM, Kometani JM, Stein SM, Nalamasu O, Macromolecules, 28(1), 110 (1995)
Kim JM, Chang TE, Park RH, Kim DJ, Han DK, Ahn KD, Chem. Mater., 712 (2000)
Kim JM, Chang TE, Kang JH, Han DK, Ahn KD, Adv. Mater., 11, 1499 (1999)
Kim JM, Chang TE, Kang JH, Park KH, Han DK, Ahn KD, Angew. Chem.-Int. Edit., 39, 1780 (2000)
Kim JM, Kang JH, Han DK, Lee CW, Ahn KD, Chem. Mater., 10, 2332 (1998)
Lee JH, Cho I, Ahn KD, Kim JM, Chem. Lett., 716 (2001)
Yoo J, Lee JH, Cho I, Ahn KD, Kim JM, Macromol. Res., 11(1), 69 (2003)
Kim S, Park SY, Adv. Mater., 15, 1341 (2003)
Coenjarts C, Garcia O, Llauger L, Palfreyman J, Vinette AL, Scaiano JC, J. Am. Chem. Soc., 125(3), 620 (2003)
Yang NC, Choi HW, Lee JK, Hwang JI, Suh DH, Chem. Lett., 824 (2002)
Pistolis G, Boyatzis S, Chatzichristidi M, Argitis P, Chem. Mater., 14, 790 (2002)
Lee CW, Yuan Z, Ahn KD, Lee SH, Chem. Mater., 14, 4572 (2002)
Spectroscopic data for the t-Boc-protected precursor 2: m.p. 93.5℃ ¹H NMR (300MHz, CDCl₃). 1.6 (s, 9H), 2.4 (s, 3H), 6.3 (s, 1H), 7.1 (dd, 1H), 7.3 (s, 1H), 7.6(d, 1H); ¹³C NMR 18.7, 27.5, 84.5, 110.0, 114.3, 117.6, 125.3, 150.8, 151.8, 153.3, 154.0, 160.4
Frechet JMJ, Eichler E, Ito H, Polymer, 24, 995 (1983)
Niu QJ, Frechet JMJ, Angew. Chem.-Int. Edit., 37, 667 (1998)

[Referenced By]

[Related Articles]

[1] Vekselman AM, Zhang C, Darling GD, Chem. Mater., 9, 1942 (1997)

[2] Schilling ML, Katz HE, Houlihan FM, Kometani JM, Stein SM, Nalamasu O, Macromolecules, 28(1), 110 (1995)

[3] Kim JM, Chang TE, Park RH, Kim DJ, Han DK, Ahn KD, Chem. Mater., 712 (2000)

[4] Kim JM, Chang TE, Kang JH, Han DK, Ahn KD, Adv. Mater., 11, 1499 (1999)

[5] Kim JM, Chang TE, Kang JH, Park KH, Han DK, Ahn KD, Angew. Chem.-Int. Edit., 39, 1780 (2000)

[6] Kim JM, Kang JH, Han DK, Lee CW, Ahn KD, Chem. Mater., 10, 2332 (1998)

[7] Lee JH, Cho I, Ahn KD, Kim JM, Chem. Lett., 716 (2001)

[8] Yoo J, Lee JH, Cho I, Ahn KD, Kim JM, Macromol. Res., 11(1), 69 (2003)

[9] Kim S, Park SY, Adv. Mater., 15, 1341 (2003)

[10] Coenjarts C, Garcia O, Llauger L, Palfreyman J, Vinette AL, Scaiano JC, J. Am. Chem. Soc., 125(3), 620 (2003)

[11] Yang NC, Choi HW, Lee JK, Hwang JI, Suh DH, Chem. Lett., 824 (2002)

[12] Pistolis G, Boyatzis S, Chatzichristidi M, Argitis P, Chem. Mater., 14, 790 (2002)

[13] Lee CW, Yuan Z, Ahn KD, Lee SH, Chem. Mater., 14, 4572 (2002)

[14] Spectroscopic data for the t-Boc-protected precursor 2: m.p. 93.5℃ ¹H NMR (300MHz, CDCl₃). 1.6 (s, 9H), 2.4 (s, 3H), 6.3 (s, 1H), 7.1 (dd, 1H), 7.3 (s, 1H), 7.6(d, 1H); ¹³C NMR 18.7, 27.5, 84.5, 110.0, 114.3, 117.6, 125.3, 150.8, 151.8, 153.3, 154.0, 160.4

[15] Frechet JMJ, Eichler E, Ito H, Polymer, 24, 995 (1983)

[16] Niu QJ, Frechet JMJ, Angew. Chem.-Int. Edit., 37, 667 (1998)