Perfluorocarbons (PFCs) are widely used in semiconductor industry. However, they intensely absorb infrared radiation and consequently aggravate the greenhouse effect. A combined plasma catalysis (CPC) technology is developed to destroy PFCs. For practical purpose the CPC is designed to function at room temperature and atmospheric pressure. In addition, this study compares three kinds of operations, i.e. catalysis, plasmas and CPC. Results indicate that CPC achieves the highest PFC destruction efficiency. Complete destructions are achieved for SF6 and NF3. Removal efficiencies for CF4 and C2F6 are 66 and 83%, respectively. The products formed in CPC process for CF4 and C2F6 are mainly CO, and a little CO. In contrast, the products formed in plasma process include Co-2, CO,COF2, and CF4. In brief, this study demonstrates that CPC is of a higher efficiency and less-toxic products for PFC removal compared with plasma technology at the given conditions. (C) 2003 Elsevier B.V. All rights reserved.