화학공학소재연구정보센터
Journal of Vacuum Science & Technology A, Vol.22, No.4, 1134-1138, 2004
Thickness uniformity of large-area double-sided thin films simultaneously deposited with biaxial substrate rotation
We have theoretically analyzed the thickness distribution of large-area double-sided thin films deposited with biaxial substrate rotation. The films were deposited from different physical vapor deposition sources (such as point, round-plate, cylinder, and conic sources) and have different thickness distribution characters. The calculated results show that the biaxial rotation is a suitable technique for simultaneous deposition on both sides from most sources if particles transfer diffusively. (C) 2004 American Vacuum Society.