Low pressure RF hollow cathode plasma jet system was used for deposition of LixZnyO thin films. Hollow cathode discharge was excited by either CW or pulse modulated RF power. Reactive sputtering of composed hollow cathode in Ar and O-2 was used for that purpose. One part of the nozzle was made of sintered Li2ZnO2 and the second one of pure metallic zinc. Chemical composition of deposited films was determined by atomic absorption spectroscopy. It was found that the ratio of Li and Zn atoms in the films was possible to change from 0.04 to 1.41 and it was dependent on the deposition conditions. Structure and orientation of crystallites were checked by XRD in Bragg-Brentano geometry Hexagonal structure of ZnO crystallites was identified in deposited films. Basically, the plane 001 had preferred orientation parallel to the substrate surface ('c' axis perpendicular to the substrate surface). Photoluminescence was studied on the deposited samples as well. Parameters of the plasma jet and sputtered atoms were investigated by 'in situ' emission spectroscopy. (C) 2003 Elsevier B.V. All rights reserved.