Previous Article Next Article Table of Contents Chemical Engineering & Technology, Vol.21, No.5, 427-430, 1998 DOI10.1002/(SICI)1521-4125(199805)21:5<427::AID-CEAT427>3.0.CO;2-H Export Citation Plasma enhanced chemical vapor deposition on powders in a low temperature plasma fluidized bed Bayer C, Karches M, Matthews A, von Rohr PR Keywords:REACTOR;PARTICLES Please enable JavaScript to view the comments powered by Disqus.
