Previous Article Next Article Table of Contents Journal of Materials Science, Vol.39, No.13, 4375-4377, 2004 DOI10.1023/B:JMSC.0000033431.52659.e5 Export Citation Preferred orientations of NiO thin films prepared by RF magnetron sputtering Ryu HW, Choi GP, Lee WS, Park JS Please enable JavaScript to view the comments powered by Disqus.