The local crystallographic texture and grain orientation was investigated for deposition of TiN by metal plasma immersion ion implantation & deposition (MePIIID) at different ion incident angles across one sample. A very good match between the tilt of (fiber) texture and the tilt of grains was observed, indicating the validity of models for ion beam assisted deposition (IBAD) also for MePIIID. A (100) orientation was obtained for 5 kV pulses at 9% duty cycle. The ion incident angle changed from near normal at the center towards 35degrees tilt away from the surface normal at the sample edge for the substrate orientation at 45degrees towards the cathode. However, due to the pulsed regime in MePIIID, there exist certain differences from IBAD. (C) 2004 American Vacuum Society.