Journal of Vacuum Science & Technology B, Vol.22, No.6, 3112-3114, 2004
Silicon nitride gate dielectric for top-gated carbon nanotube field effect transistors
We develop and demonstrate a process to fabricate top-gated carbon nanotube transistors using silicon nitride as the gate dielectric. I-V curves of these silicon nitride gated nanotube transistors are measured. (C) 2004 American Vacuum Society.