Recently, DNA properties have been investigated to realize new functional biodevices. However. there are few reports on DNA nanopatterning to make bionanodevices. Therefore. we have attempted DNA nanopattering by using a nanoimprint method. On a glass substrate coated with poly-L-lysine, which is known as a material for DNA immobilization by UV radiation, about 100 111 of a 1 mug/mul DNA solution was applied and was dried at 60degreesC for an hour. and was irradiated by UV for 2 min. Further 4 % polyvinyl alcohol (PVA) solution was coated on the substrate. The substrate was imprinted at 100degreesC and 6 MPa for 5 min, and a mold was applied with a SiO2 on Si substrate fabricated by electron-beam lithography and dry etching. Etching of the DNNA substrate was done by reactive ion etching in 0(2) atmosphere. Finally, the PVA layer washed down by water. and the DNA nanopatterning was obtained. (C) 2004 American Vacuum Society.