Journal of Vacuum Science & Technology B, Vol.22, No.6, 3493-3496, 2004
Lithographic patterning of a highly metallized polymer resist system and pyrolytic or plasma treatment to afford ferromagnetic ceramics
The highly metallized polymer cobalt-clusterized polyferrocenylsilane (Co-PFS) has been shown to act as a negative-tone resist for electron-beam lithography and UV-photolithography. Ferromagnetic ceramics containing Fe/Co alloy nanoparticles result from subsequent pyrolysis or reactive ion etching in a secondary magnetic field. (C) 2004 American Vacuum Society.