Structurally robust block copolymer templates with feature sizes of approximately 10 nm were prepared from functionalized poly(methyl methacrylate)-b-polystyrene block copolymers. By the inclusion of benzoeyclobutene crosslinking groups in the polystyrene block, the covalent stabilization of thin films to both thermal treatment and solvent exposure became possible. In addition, the crosslinking of the poly(styrene-benzoeyclobutene) domains at 220 degreesC, followed by the removal of poly(methyl methaerylate), provided a robust, crosslinked nanostructure with greater processing and fabrication potential. (C) 2005 Wiley Periodicals, Inc.