A class of phase shifting test mask patterns is introduced for monitoring both linear and circular polarization balance of the illumination in high-numerical aperture (NA) and immersion projection printing systems. Four test mask patterns are constructed of periodic, alternating phase, radial arrays to scatter light into high angle spatial frequencies to create a central intensity dependent only on the local state of polarization. Two two-phase patterns measure the orthogonal linear polarization components while an additional two four-phase patterns determine the phase relationship between those components. When exposed in a dose matrix in photoresist, they can likely measure polarization imbalance to within a few percent. Based on these patterns, a technique is introduced for predicting image degradation in IC production due to polarization and high-NA effects. (C) 2005 American Vacuum Society.