Previous Article Next Article Table of Contents Chemical Engineering Journal, Vol.72, No.2, 171-182, 1999 DOI10.1016/S1385-8947(98)00153-3 Export Citation Application of neural networks to the modeling of LPCVD reactors - Deposition of in-situ boron-doped silicon Fakhr-Eddine K, Cabassud M, Lann MV, Couderc JP Keywords:CHEMICAL VAPOR-DEPOSITION;PRESSURE;SYSTEM;GROWTH Please enable JavaScript to view the comments powered by Disqus.
