화학공학소재연구정보센터
Chemical Engineering Journal, Vol.107, No.1-3, 55-62, 2005
Vortex centrifugal bubbling reactor
The vortex centrifugal bubbling apparatus is considered as a basis for a new type of multiphase vortex centrifugal bubbling reactor. In this device, a highly dispersed gas-liquid mixture is produced in the field of centrifugal forces inside the vortex chamber. The operation of the vortex centrifugal bubbling apparatus is based on the rotation of liquid by the tangential entry of gas flows via the many tangential guiding vanes around the periphery of the vortex chamber. At certain regimes there appears a highly dispersed gas-liquid vortex bubbling layer. Vortex bubbling layer represents the following unique characteristics: low hydrodynamic resistance (1000-2000 Pa); homogeneity and stability over wide range of centrifugal acceleration (10(2) to 10(3) m/s(2)); large specific surface with the high renovation rate (of about 5 m(2) per 11 of water); high gas content (of about 0.5-0.6); high gas throughput (up to 200-300 m(3) of gas per 11 of liquid per hour) and, consequently, very high rates of heat and mass transfer. The energy consumption for the vortex bubbling layer maintenance is about 50-80 W per 11 of treated liquid. The design features of the vortex chamber are described in view of the methods of stabilization of the vortex bubbling layer. The data on the hydrodynamic resistance, the structure and the lifetime of the vortex gas-liquid layer are presented. The main advantages and features of the devices of this type are discussed in view of their possible application. (c) 2004 Elsevier B.V. All rights reserved.