The hollow cathode in the diffuse arc regime (arc with hot thermionic cathode) was used for deposition of chromium and chromium nitride films. The chromium hollow cathode serving as a gas inlet was connected to a radio frequency (rf) generator with the rf power up to 350 W. The process of generation and performance of the hollow cathode discharge and its transition to the arc regime was examined for different gases. The comparison is also given with other target metals. The reactive process of CrN deposition was investigated. Films were deposited on unheated silicon and steel substrates. Highly oriented crystalline CrN films were deposited at rates up to 4.5 mu m/min. The effect of process parameters and their correlation to properties (microcrystalline structure, hardness, and deposition rate) of CrN is given. (c) 2005 American Vacuum Society.