The electrosynthesis of poly-o-methoxyaniline (POMA) is studied under potentiostatic, potentiodynamic and pulse potentiostatic conditions. The three types of POMA layers are compared with respect to their electrochemical behaviour, stability and surface morphology. Copper electrodeposition is comparatively studied in the three types of POMA at two different thicknesses. It is established that for thin (< 1 mu m) POMA coatings copper deposition occurs in one and the same way in all layers, defects (e.g. large pores) being most probably the promoters for metal crystallization. In contrast, thick POMA layers synthesized by the three electrochemical procedures show marked difference with respect to the amount and location of the deposited copper species. (c) 2005 Elsevier B.V. All rights reserved.