We have fabricated diamond microstructures using silicon molds into which microcrystalline diamond was deposited by plasma assisted chemical vapor deposition. Prior to diamond deposition the silicon molds were seeded with the diamond powder of two different grain sizes, 1/4 and 1 mu m. Scanning electron microscopy and atomic force microscopy were used to view and characterize the resultant diamond microstructures. Analysis of the diamond replicas indicates better reproduction fidelity for the 1/4 mu m diamond powder, and a surface roughness of 20 nm. (c) 2005 American Vacuum Society.