Pulsed laser deposition has been used to grow epitaxially oriented thin films of Cu and Pt on (100)-oriented SrTiO3 and LaAlO3 Substrates. Xray diffraction results illustrated that purely epitaxial Cu(100) films could be obtained at temperatures as low as 100 degrees C on SrTiO3 and 300 degrees C on LaAlO3. In contrast, epitaxial (100)-oriented Pt films were attained on LaAlO3(100) only when deposited at 600 degrees C. Atomic force microscopy images showed that films deposited at higher temperatures consisted of 3D islands and that flat, layered films were obtained at the lowest deposition temperatures. Importantly, Cu films deposited at 100 degrees C on SrTiO3(100) were both purely (100)-oriented and morphologically flat. Pt and Cu films displaying both epitaxial growth and smooth surfaces could be obtained on LaAlO3(100) only by using a three-step deposition process. High-resolution transmission electron microscopy demonstrated an atomically sharp Cu/SrTiO3 interface. The crystalline and morphological features of Cu and Pt films are interpreted in terms of the thermodynamic and kinetic properties of these metals. (c) 2005 Elsevier B.V. All rights reserved.