Lignin model surfaces were prepared from aqueous alkaline solutions by spin-coating on silica wafers. Films of thicknesses between 20 and 140 nm were easily made by variations in the spinning rate or in the lignin concentration. The roughnesses of the lignin surfaces were relatively low, approximately 1.1 nm (rms) on an area of 25 mu m(2), as determined by atomic force microscopy imaging. The stability of the lignin films in aqueous solutions was found to be excellent. No changes in the thickness of model surfaces immersed in slightly alkaline solutions (pH 9.2) could be detected even after 5 It soaking. A 10 percent reduction in the thickness of the lignin film was observed after 5 It of exposure to a solution containing 0.1 M NaCl. This novel preparation method opens great possibilities for further fundamental studies, where interactions between lignin and other substances are of interest to investigate.