The semiconductor industry has started the technology transition from 200 min to 300 min wafers to improve manufacturing efficiency and reduce manufacturing cost. These technological changes present a unique opportunity to optimally design the process control systems for the next generation fabs. In this paper we first propose a hierarchical fab-wide control framework with the integration of 300 min equipment and metrology tools and highly automated material handling system. Relevant existing run-to-run technology is reviewed and analyzed in the fab-wide control context. Process and metrology data monitoring are discussed with an example. Missing components are pointed out as opportunities for future research and development. Concluding remarks are given at the end of the paper. (c) 2005 Published by Elsevier Ltd.