화학공학소재연구정보센터
Journal of Vacuum Science & Technology B, Vol.23, No.6, 2684-2693, 2005
Simulation of air bubble scattering effects in 193 nm immersion interferometric lithography
In 193 nm immersion lithography, the presence of air bubbles in water poses a serious concern to the resist image formation. In this study, air bubble scattering effects were characterized by the Mie theory and the finite-difference time-domain (FDTD) method. The influence range Of bubbles both in forward and lateral directions with respect to their sizes v,,as analyzed. It is predicted that as bubble size exceeds 90 nm in diameter, light scattering becomes significant. In the FDTD simulation, the effects of scattered waves in two- and three-beam interferometric lithography were simulated to mimic the actual imaging formation in an immersion scanner, It is found that the more beams are involved in the image formation, the more scattered waves interfere with the image forming waves, and then degrade the final image. Finally, the effect of a moving bubble was also simulated. The phenomenon of image distortion in the presence of bubbles was simulated by employing the three-dimensional FDTD method. (c) 2005 American Vacuum Society.