Resists using polyphenol resin are introduced to reduce line-edge roughness (LER), and the spatial frequency characteristics of LER are evaluated. It is found that the long-period components of LER are suppressed in our low molecular-weight polyphenol resists. Device simulation using the measured LER shows that our polyphenol-based resist can drastically reduce the number of low-threshold-voltage (V-th) transistors compared with a conventional resist due to reduced long-period LER. Because LER impact is more serious as the transistor width shrinks, our results suggest that the use of the polyphenol-type resist will be more effective in improving device performance in future lithography process. In addition, it is shown that spectral analysis is a powerful tool for LER evaluation, especially from the viewpoint of device performance estimation. (c) 2005 American Vacuum Society.