A process to stabilise the formation of NiGe using Zr alloying engineering approach was investigated. The NiGe film maintained continuity up to 600 degrees C with NiGe phase stable up to 700 degrees C. Secondary ion mass spectroscopy and transmission electron microscopy characterisations showed that a thin ZrOx layer was formed on top of NiGe. The ZrOx layer acted as a capping layer to NiGe. As a result, the morphology and phase formation of NiGe were stabilised. We propose Ni(Zr) alloy as a promising material for germanides metallisation contacts in metal-oxidesemi-conductor field-effect transistors (MOSFETs). (c) 2005 Elsevier B.V. All rights reserved.