화학공학소재연구정보센터
홈 로그인 로그아웃 연락처 사이트맵
Macromolecular Research, Vol.14, No.3, 300-305, June, 2006
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Positive-Type Photosensitive Polyimide Based on a Photobase Generator Containing Oxime-Urethane Groups as a Photosensitive Compound
Young Min Jang, Ji Young Seo, Kyu Ho Chae†, and Mi Hye Yi1
  • Department of Applied Chemistry and Polymer Science and Technology Research Center, Chonnam National University, Gwangju 500-757, Korea
  • 1Advanced Materials Division, Korea Research Institute of Chemical Technology, P. O. Box 107, Yusong, Daejeon 305-606, Korea
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The chemical structure of a semi-aromatic polyimide-I, which was prepared by the chemical imidization of cyclopentanetetracarboxylic dianhydride and 2,2-bis(4-aminophenyl)hexafluoropropane, was characterized by 13C-NMR spectroscopy. The chemically imidized polyimide-I was used for the preparation of a photosensitive polyimide (PSPI) through the addition of benzophenone and benzophenone oxime hexamethylene diurethane (BOHD), a photobase generator containing oxime-urethane groups. The polyimide-I film containing benzophenone and BOHD was not soluble in 2.38 wt% tetrabutylammonium hydroxide solution in H2O. However, it became soluble following irradiation with 310 nm UV light. A positive tone image with a resolution of 5 μm was obtained with this PSPI, having sensitivity (Dc) of 1.2 J/cm2 and contrast (γp) of 1.08. Thus, a polyimide, which is not intrinsically photosensitive, can become photosensitive through the addition of a photobase generator containing oxime-urethane groups as a photosensitive compound.
Keywords:irradiation;photobase generator;positive photoresist;photosensitive polyimide;photosensitive compound
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