An RF magnetron plasma-enhanced chemical vapor deposition system with variable magnetic field (MagPECVD) was utilized for high rate deposition of diamond-like carbon thin films. Deposition rate was nonuniform, with minimum value of 30 nm/min in the center of the cathode where the low ionic flux is determined by the absence of the E x B electronic drift. The highest value of 1029 nm/min was registered in the position of the cathode with the highest ion flux determined by the presence of the E x B electronic drift. Hardness, elastic modulus and RMS roughness of thin films were dependent on local values of magnetic field intensities and the values of input power. (c) 2005 Elsevier B.V. All rights reserved.