A low-pressure dielectric barrier discharge plasma has been generated in a micro capillary and in a microchannel fabricated in a Pyrex chip. Plasma chemical vapor deposition (P-CVD) of platinum films by the micro capillary plasma can be done successfully by using platinum bisacetylacetonate (Pt(C5H7O2)(2)) as a precursor. Uniform deposition between electrodes can be achieved by controlling the voltage and frequency. With proper voltage control, deposition increases between electrodes as frequency increases. These experiments show that the P-CVD technique can be useful to make films inside a microchannel. (c) 2005 Elsevier B.V. All rights reserved.