The deposition rate of amorphous carbon film is improved from 1 to 100 nm/min by magnetically driving the shunting arc which is a self-ignition-type pulsed metal/solid plasma source for plasma-based ion implantation and deposition (PBII&D). The plasma is accelerated along the carbon rails with an average velocity of 4 km/sec under a pressure ranging from 0.054 to 1.4 Pa, and goes out towards a target set at 40 mm apart from the muzzle. From the equation of motion, the carbon particle density between the rails is estimated to be 1.7 x 10(15) m(-3). The carbon ion density around the target is obtained to be 1.7 x 10(14) m(-3) using the measurement of the ion current into the target applied negative bias voltage. The deposition rate of amorphous carbon film increases from 1 to 100 nm/min by magnetically driving of the shunting plasma. (c) 2005 Elsevier B.V. All rights reserved.