화학공학소재연구정보센터
Journal of Colloid and Interface Science, Vol.219, No.2, 357-359, 1999
The effect of electromagnetic retardation on the rupture process of a very thin liquid film
Effects of electromagnetic retardation on the rupture process of a very thin liquid film coated on a flat plate are studied. The analysis results indicate that the electromagnetic retardation effect (D) for the case A > 0 (attraction) is a stabilization factor, which prolongs the rupture time. The wavenumber of the most unstable mode is decreasing as D increases. It is also found that the linear solution of rupture time T-LM is larger than the nonlinear rupture time T-NM, but the gradient of T-LM to D is comparable to that of TNM.