A microfabrication method for mesoporous silica (MPS) film on a flexible polymer substrate is proposed. The method consists of three processes. First, by using a spatially defined microtemplate consisting of dual self-assembled monolayers (SAMs) with alternating trifluorocarbon (CF3) and amino (NH2) groups, a mesostructured silica/surfactant composite (MSSC) film was site-selectively deposited on the CF3-terminated SAM regions through hydrophobic and van der Waals interactions between the surfactant molecules and the hydrophobic SAM surface. Next, in order to transfer these prefabricated MSSC micropatterns to a poly(ethyleneterephthalate) (PET) substrate, the sample was pressed firmly against the PET surface for 60 min at 90 degrees C under a pressure of 4 MPa. Due to the weak adhesion between the MSSC film and the CF3-terminated SAM surface, the deposited MSSC micropatterns readily peeled off the SAM surface and were transferred to the PET substrate while preserving both the morphology and the nanostructures of the micropatterns, as evidenced by atomic force microscopy (AFM), scanning electron microscopy, energy dispersion x-ray spectroscopy, and x-ray diffractometry (XRD). Finally, to remove the surfactant molecules and obtain well-defined nanopores, a photochemical approach, known as "photocalcination," using UV light of 185 and 254 nm wavelengths was employed. Fourier transform infrared spectroscopy XRD, and AFM confirmed that the surfactant molecules were completely eliminated from the, MSSC micropatterns without distorting either their finely patterned microstructures or their well-ordered periodic nanostructures. Through this technique, well-shaped 5 mu m wide MPS micropatterns were fabricated on the flexible PET substrates. These embedded MPS micropatterns adhered tightly to the PET substrates and no peeling was observed in a Scotch (R) tape peeling test. (c) 2006 American Vacuum Society.