A novel high mobility transparent conductive oxide thin film, tungsten-doped indium oxide (IWO), has been successfully grown on conventional glass substrates by reactive direct current magnetron sputtering technique from a metallic target. Analyses of x-ray photoelectron spectroscopy and x-ray diffraction reveal that tetravalent and hexavalent tungsten ions substitute for trivalent host indium ions without changing the crystalline structure of In2O3. IWO thin films were grown with resistivity of 4.4 x 10(-4) Omega cm, carrier mobility of 52.8 cm(2) V-1 S-1; transmittance exceeding 80% at wavelengths between 380 and 900 nm, and average roughness of 7.5 nm. (c) 2006 American Vacuum Society.