Cyclohexane has been frequently used as a selective solvent to remove PS layers or domains from polystyrene: poly(methyl methacrylate) (PS:PMMA) blends and for reorganization or self-assembly of polymer brushes and block copolymers. We have found that cyclohexane is not efficient at PS removal, observing significant residual PS at PMMA surfaces. In contrast, 1-chloropentane was found to be a far greater selective solvent (i. e., residual PS was essentially nonexistent). These results were compared to PMMA surfaces after PS was allowed to adsorb to the surface from a dilute theta solution in cyclohexane. Using near-edge X-ray absorption fine structure spectroscopy and inverse gas chromatography, coupled with self-consistent mean-field theory calculations, we have demonstrated that selectively washing a polymer from a polymer blend is nearly identical to adsorption of a polymer to a "soft" surface from a dilute solution. Improved knowledge about the effects of selective solvents will improve experimental analysis of washed systems as well as manipulation of block copolymers and polymer brushes for reorganization or self-assembly.