Silver tantalate AgTaO3 (ATO) and silver niobate AgNbO3 (ANO) films have been grown on to the LaAlO3 (001) and sapphire Al2O3 (0112, r-cut) single crystals by pulsed laser deposition technique from stoichiometric ATO and ANO targets. X-ray diffraction study revealed epitaxial quality of ATO and ANO films on the LaAlO3 (00 1) Whereas on the sapphire r-cut substrate they are preferential (I 10) and (00 1) oriented. To characterize microwave films properties in the range from I to 40 GHz, coplanar line interdigital capacitors were fabricated by photolithography and lift-off technique. ANO film capacitors show superior properties: frequency dispersion was as low as 13%, voltage tunability (40 V, 200 kV/ cm) was about 4.6% at 20 GHz, loss tangent similar to 0.106 at 20 GHz, K-factor-tunability/tan delta from 49% @ 10 GHz to 33% at 40 GHz. (c) 2006 Elsevier B.V. All rights reserved.