Chemical Reviews, Vol.96, No.4, 1519-1532, 1996
Surface-Chemistry in the Chemical-Vapor-Deposition of Electronic Materials
Keywords:HYDROGENATED AMORPHOUS-SILICON;ATOMIC LAYER EPITAXY;MONTE-CARLO SIMULATION;PLASMA-INDUCED DEPOSITION;FILM GROWTH;DESORPTION-KINETICS;THIN-FILMS;GAS-PHASE;ASSISTED DEPOSITION;STEP COVERAGE