Electrodeposition of PbTe thin films from an acidic nitric bath was systematically investigated to understand the kinetics and the effect of electrodeposition conditions on film composition, crystallographic structure, texture and grain size. The electroanalytical studies employed initially with a rotating disk electrode to investigate the kinetics associated with Te, Pb and PbTe electrodeposition. The results indicated that the PbTe thin films were obtained by the underpotential deposition (UPD) of Pb atoms onto the overpotentially deposited Te atoms on a substrate. Based on these studies, PbTe thin films were potentiostatically electrodeposited using e-beam evaporated gold thin films on silicon substrate to investigate the effect of various deposition conditions on film composition and microstructure. The data indicated that the microstructure, composition and preferred film growth orientation of PbTe thin films strongly depended on the applied potential and electrolyte concentration. At -0.12 V, the film was granular, dense, and preferentially oriented in the [ 100] direction. At potentials more negative than -0.15 V, the film was dendritic and preferentially oriented in the [211] direction. A smooth, dense and crystalline film with nearly stoichiometric composition was obtained at -0.12 V from a solution containing 0.01 M HTeO2+, 0.05 Pb2+ and 1 M HNO3. (c) 2006 Elsevier Ltd. All rights reserved.