Chemical Reviews, Vol.99, No.7, 1801-1821, 1999
Lithographic imaging techniques for the formation of nanoscopic features
Keywords:DEEP-ULTRAVIOLET RESISTS;X-RAY-LITHOGRAPHY;CHEMICALLYAMPLIFIED RESIST;ION PROJECTION LITHOGRAPHY;ELECTRON-BEAMLITHOGRAPHY;ACID-DIFFUSION;193 NM;INTERFEROMETRICLITHOGRAPHY;TRIPHENYLSULFONIUM SALTS;PHOTOACID GENERATORS