In this paper, we have studied the pulsed laser deposition process of a submonolayer and several monolayers using the Monte Carlo approach. In this model, the deposition and absorption of atoms, and the diffusion and dissociation of adatoms on the surface of substrates or top layer with tetragonal structure were considered. The quality of the film growth is controlled by three parameters, namely, the temperature of the substrate, the kinetic energy of the atoms and the number of particles in each pulse. The interatomic interactions are taken from a Morse potential. The simulated results show that the morphology and surface roughness of the submonolayer films and films of several monolayers are strongly depended on the three parameters. Small islands and smoother surface are obtained with a lower substrate temperature, a lower kinetic energy and a suitable number of atoms in each pulse. We find different optimization conditions for submonolayer films and films of several monolayers. (c) 2006 Elsevier B.V. All rights reserved.