Octadecyltrimethoxysilane (OTMS) self-assembled monolayers have been grafted on micrometric and nanometric areas Of SiO2/Si substrates using a process combining nanoimprint lithography and atmospheric chemical vapor deposition. The optimization of the process has lead to monolayer square patterns of OTMS with lateral sizes ranging from 2 mu m down to 50 nm. Their coverage uniformity extends on several square millimeters. Their coverage density can be accurately tuned by the deposition time. (c) 2007 American Vacuum Society.