This article reports on the fabrication of a transparent nanodot array mold for nanoimprint and so on. In the mold fabrication, the combination of a porous alumina master mold made by anodization of an Al plate and spin on glass replica process is utilized to pattern nanodot array on a transparent mold with large area. Using this method, the authors could obtain transparent nanodot array mold pattern with a pitch of about 100 nm and height/depth of 90 nm. When this nanodot array mold was used for photonanoimprint, a pitch of the photonanoimprinted pattern was found to be about 100 nm. The pitch is considered quite comparable to the pitch of the patterns on the porous alumina master mold. (c) 2007 American Vacuum Society.