화학공학소재연구정보센터
홈 로그인 로그아웃 연락처 사이트맵
Journal of Industrial and Engineering Chemistry, Vol.13, No.3, 434-437, May, 2007
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Photocatalytic Characteristics of TiO2 Thin Films Deposited by PECVD
Dong Lyun Cho†, Ho Min, Jong-Ho Kim, Geun-Seop Cha, Gwi-Sung Kim, Byung Hoon Kim1, and Seung-Ho Ohk2
  • Research Center for Photonic Materials and Devices, Center for Functional Nano Fine Chemicals, 2nd stage of BrainKorea 21, Chonnam National University, Gwangju 500-757, Korea
  • 1Department of Dental Material, College of Dentistry, 2nd stage of Brain Korea 21, Chosun University, Gwangju501-759, Korea
  • 2Department of Oral Microbiology, 2nd stage of Brain Korea 21 for Dental School, Chonnam National University, Gwangju 500-757, Korea
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TiO2 thin films were deposited on glass slides through PECVD with TTIP as a precursor and argon as a carrier gas; their photocatalytic characteristics were investigated. The films were amorphous when deposited at low temperatures, but crystalline with anatase structures at temperatures higher than 300 ℃. The film deposited at 400 ℃ and 5 W exhibited excellent adhesion to the substrate and the best photocatalytic activity. The photocatalytic activity was evaluated based on the degradation efficiency of MB and the bactericidal effect against E. coli under UV-A light. The concentration of MB reduced from 5.0 to 3.5 ppm in 3 h; 99% of E. coli (2 × 105 CFU/mL) was killed in 1 h.
Keywords:TiO2 photocatalyst;PECVD;MB degradation;E. coli
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