열처리 실리카겔의 염소계 휘발성 유기화합물 흡착특성 연구

남경수; 권상숙; 유경선; Kyung Soo Nam; Sang Soog Kwon; Kyung Seun Yoo

Journal of the Korean Industrial and Engineering Chemistry, Vol.18, No.3, 245-250, June, 2007

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열처리 실리카겔의 염소계 휘발성 유기화합물 흡착특성 연구

Characteristics of Chlorinated VOCs Adsorption over Thermally Treated Silica Gel

남경수, 권상숙, 유경선 ^†

광운대학교 환경공학과

Kyung Soo Nam, Sang Soog Kwon, and Kyung Seun Yoo^†

Department of Environmental Engineering, Kwangwoon University, Seoul 139-701, Korea

E-mail:

초록

실리카겔의 열처리 온도에 따른 1,2-dichlorobenzene의 흡착 특성을 모멘트 법으로 고찰하였다. 실리카겔의 열처리 온도는 150, 500, 800 ℃로 변화시켰으며 고정층 반응기를 사용하여 TCD (Thermal Conductivity Detector)가 장착된 기체크로마토 그래프에서 1,2-dichlorobenzene의 펄스 응답곡선을 측정하였다. 1,2-dichlorobenzene의 평형흡착상수와 표면 흡착열은 열처리 온도 500 ℃에서 가장 높은 값을 나타내었다. 열처리 온도가 증가함에 따라 실리카겔 표면의 수분과 OH 작용기가 제거되어 1,2-dichlorobenzene과의 상호작용이 증가한 것으로 판단된다. 고온인 800 ℃에서 열처리한 실리카겔은 비표면적이 감소하여 평형흡착상수와 흡착열, 모두 감소한 것으로 사료된다. 모멘트 해석으로 계산된 축분산 계수는 0.046 × 10-4∼1.033 × 10-4m2/sec였으며 기공 내의 확산계수는 500 ℃ 열처리 실리카겔에서 가장 낮은 것으로 나타났다.

Adsorption characteristics of 1,2-dichlorobenzene on the surface of heat treated silica gel were determined by the moment analysis. The heat treatment of the silica gel was performed at temperatures of 150, 500, and 800 ℃ and pulse-response of 1,2-dichlorobenzene was measured in a gas chromatograph equipped with thermal conductivity detector (TCD) using the packed column. Equilibrium adsorption constants and isosteric heat of adsorption were recorded the highest value at 500 ℃. This might be due to the increase of interaction between silica surface and 1,2-dichlorobenzene as the decrease of OH concentration and moisture by increase of heating temperature. Axial dispersion coefficient calculated by the moment method was about 0.046 × 10-4-1.033 × 10-4m2/sec and pore diffusivity of heat treated silica gel at 500 ℃ measured the lowest value. Because heat treating at 800 ℃ caused the specific surface area to reduce, equilibrium adsorption constants and isosteric heat of adsorption were decreased.

Keywords:adsorption;moment method;silica gel;o-DCB;heat treatment

[References]

Shin JW, Master Thesis, Kwangwoon Univ., Seoul, Korea (2003)
Shin JW, Yoo KS, Park SY, Song KS, J. Ind. Eng. Chem., 12(3), 418 (2006)
Kim SC, Hong IK, J. Ind. Eng. Chem., 4(3), 177 (1998)
Ruthven DM, Principle of Adsorption and Adsorption Process, 1, 6, John Wiley and Sons, New York (1984)
Schneider P, Smith JM, AIChE J., 14, 762 (1968)
Zhuravlev LT, Colloid and Surface J., 173, 1 (2000)
Li Z, Liu C, Zhao Q, J. Non-Cryst., 265, 189 (2000)
Breysse PN, Cappabianca AM, Hall TA, Risby T, Carbon, 25, 803 (1987)
Chihara K, Suzuki M, Kawazoe K, AIChE J., 24, 237 (1978)
Welty JR, Wicks CE, Wilson RE, Fundamentals of Momentum, Heat, and Mass Transfer, 3, 487, John Wiley and Sons, New York (1984)
Schneider P, Smith JM, AIChE J., 14, 886 (1968)
Yang XN, Matthews MA, Chem. Eng. J., 93(2), 163 (2003)

[Referenced By]

[Related Articles]

[1] Shin JW, Master Thesis, Kwangwoon Univ., Seoul, Korea (2003)

[2] Shin JW, Yoo KS, Park SY, Song KS, J. Ind. Eng. Chem., 12(3), 418 (2006)

[3] Kim SC, Hong IK, J. Ind. Eng. Chem., 4(3), 177 (1998)

[4] Ruthven DM, Principle of Adsorption and Adsorption Process, 1, 6, John Wiley and Sons, New York (1984)

[5] Schneider P, Smith JM, AIChE J., 14, 762 (1968)

[6] Zhuravlev LT, Colloid and Surface J., 173, 1 (2000)

[7] Li Z, Liu C, Zhao Q, J. Non-Cryst., 265, 189 (2000)

[8] Breysse PN, Cappabianca AM, Hall TA, Risby T, Carbon, 25, 803 (1987)

[9] Chihara K, Suzuki M, Kawazoe K, AIChE J., 24, 237 (1978)

[10] Welty JR, Wicks CE, Wilson RE, Fundamentals of Momentum, Heat, and Mass Transfer, 3, 487, John Wiley and Sons, New York (1984)

[11] Schneider P, Smith JM, AIChE J., 14, 886 (1968)

[12] Yang XN, Matthews MA, Chem. Eng. J., 93(2), 163 (2003)