Azido기를 함유한 수용성 포토레지스트 제조 및 감광 특성

윤근병; 이준태; 한정엽; 이동호; Keun-Byoung Yoon; Joon-Tae Lee; Jeong-Yeop Han; Dong-Ho Lee

Polymer(Korea), Vol.31, No.5, 374-378, September, 2007

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Azido기를 함유한 수용성 포토레지스트 제조 및 감광 특성

Preparation and Properties of Water-Soluble Photosensitive Polymer with Azido Group

윤근병 , 이준태¹, 한정엽², 이동호 ^†

경북대학교 고분자공학과
¹산업기술시험원
²LG실트론

Keun-Byoung Yoon , Joon-Tae Lee¹, Jeong-Yeop Han², and Dong-Ho Lee^†

Department of Polymer Science, Kyungpook National University, Daegu 702-701, Korea
¹Material Testing Team, Korea Testing Laboratory, Seoul 152-848, Korea
²LG Siltron, Gumi, Gyungpook 730-340, Korea

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초록

Acrylamide(AM), diacetone acrylamide(DAAM) 및 acrylic acid(AAc)를 사용하여 수용성 삼원공중합체를 제조하고, 4-azidoaniline을 반응하여 azido기를 고분자 곁사슬에 도입한 일성분계 포토레지스트를 제조하였다. AM을 주성분으로 하고 DAAM을 공단량체로 사용한 공중합체를 합성하고, 광가교제로 4,4’-diazidostilbene-2,2’-disulfuric acid sodium salt(DAS)를 혼합한 이성분계 포토레지스트를 제조하여 두 종류 포토레지스트의 감광특성을 비교하였다. 포토레지스트의 azido기 1 mol에 대한 감광특성은 고분자 곁사슬에 azido기를 가진 일성분계의 경우가 bis-azido기를 가진 이성분계보다 약 4배 정도 우수한 감광성을 나타내었다. 직경 110 μm 크기의 원형패턴을 낮은 광세기에서 일성분계 포토레지스트를 사용하여 얻었으며, 노광부와 비노광부 계면에 잔존물이 없이 원형 패턴이 형성되어 블랙 매트릭스용 negative 포토레지스트로 활용이 기대된다.

Water-soluble terpolymer of acrylamide, diacetone acrylamide, and acrylic acid was prepared by redox initiators in aqueous medium. One component photoresist was synthesized by reaction of terpolymer with 4-azidoaniline. By blending the aqueous acrylamide/diacetone acrylamide copolymer solution with bisazide, 4,4′-diazidostilbene-2,2′-disulfuric acid sodium salt, two component photoresist was prepared. The photosensitivity per azido group unit mole of one component photoresist was 4 times higher than that of two component photoresist. The dot-type pattern was successfully achieved with one component photoresist at low exposure energy, which is prospective to be used as black matrix negative photoresist.

Keywords:negative photoresist;azido group;photosensitivity;black matrix

[References]

Reiser A, Photoreactive Polymers; The Science and Technology of Resist, John Wiley & Sons, NewYork (1989)
Ichimura K, Watanabe S, J. Polym. Sci. A: Polym. Chem., 18, 613 (1980)
Ichimura K, Watanabe S, J. Polym. Sci. A: Polym. Chem., 18, 891 (1980)
Ichimura K, J. Polym. Sci. A: Polym. Chem., 20, 1411 (1982)
Ichimura K, Watanabe S, J. Polym. Sci. A: Polym. Chem., 20, 1419 (1982)
Ichimura K, Oohara N, J. Polym. Sci. A: Polym. Chem., 25, 3063 (1987)
Egerton PL, Trigg J, Hyde EM, Reiser A, Macromolecules, 14, 100 (1981)
Reiser A, Pitts E, J. Photogr. Sci., 29, 187 (1981)
Iwayanaki T, Hashimoto M, Nonogaki S, Kobuchi S, Makino D, Polym. Eng. Sci., 23, 935 (1983)
Agaki M, Nonogaki S, Kohashi T, Oba Y, Oikawa M, Tomita Y, Polym. Eng. Sci., 17, 353 (1977)
Kohashi T, Agaki M, Nonogaki S, Hashimoto M, Hayashi N, Tomita Y, Photogr. Sci. Eng., 23, 168 (1979)
Reiser A, Egerton PL, Photogr. Sci. Eng., 23, 144 (1979)
Merrill SH, Unruh CC, J. Appl. Polym. Sci., 7, 273 (1963)
Hoke DI, Surbey DL, Oviatt WR, Macromol. Symp., 6, 95 (1977)
Coleman LE, Bork JF, Wyman DP, Hoke DI, J. Polym. Sci. A: Polym. Chem., 3, 1601 (1965)
Yan M, Cai SX, Wybourne MN, Keana JFW, J. Mater. Chem., 6, 1249 (1996)

[Related Articles]

[1] Reiser A, Photoreactive Polymers; The Science and Technology of Resist, John Wiley & Sons, NewYork (1989)

[2] Ichimura K, Watanabe S, J. Polym. Sci. A: Polym. Chem., 18, 613 (1980)

[3] Ichimura K, Watanabe S, J. Polym. Sci. A: Polym. Chem., 18, 891 (1980)

[4] Ichimura K, J. Polym. Sci. A: Polym. Chem., 20, 1411 (1982)

[5] Ichimura K, Watanabe S, J. Polym. Sci. A: Polym. Chem., 20, 1419 (1982)

[6] Ichimura K, Oohara N, J. Polym. Sci. A: Polym. Chem., 25, 3063 (1987)

[7] Egerton PL, Trigg J, Hyde EM, Reiser A, Macromolecules, 14, 100 (1981)

[8] Reiser A, Pitts E, J. Photogr. Sci., 29, 187 (1981)

[9] Iwayanaki T, Hashimoto M, Nonogaki S, Kobuchi S, Makino D, Polym. Eng. Sci., 23, 935 (1983)

[10] Agaki M, Nonogaki S, Kohashi T, Oba Y, Oikawa M, Tomita Y, Polym. Eng. Sci., 17, 353 (1977)

[11] Kohashi T, Agaki M, Nonogaki S, Hashimoto M, Hayashi N, Tomita Y, Photogr. Sci. Eng., 23, 168 (1979)

[12] Reiser A, Egerton PL, Photogr. Sci. Eng., 23, 144 (1979)

[13] Merrill SH, Unruh CC, J. Appl. Polym. Sci., 7, 273 (1963)

[14] Hoke DI, Surbey DL, Oviatt WR, Macromol. Symp., 6, 95 (1977)

[15] Coleman LE, Bork JF, Wyman DP, Hoke DI, J. Polym. Sci. A: Polym. Chem., 3, 1601 (1965)

[16] Yan M, Cai SX, Wybourne MN, Keana JFW, J. Mater. Chem., 6, 1249 (1996)