화학공학소재연구정보센터
Journal of Industrial and Engineering Chemistry, Vol.13, No.5, 781-785, September, 2007
Photochemical Immobilization of Polymer Films on Si Wafer via Monolayers of Perfluorophenyl Azide Derivatives
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We report a simple and effective method to photochemically attach thin polymeric layers to solid surface. The system is based on a photoreactive perfluorophenyl azide (PFPA) derivatives which is bound to SiO2 suface via a silane anchor. This substrate is then covered with a polymer film that is reacted with the azide moieties by UV irradiation. As a result of the photochemical reaction, a thin layer of the polymer is covalently bound to the surface. Unbounded polymer is removed by sonication. As examples, we have successfully attached thin films of polystyrene and poly(2-ethyl-2-oxazoline). The thickness of the film is a function of the irradiation time and the molecular weight of the polymer.
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