The authors have fabricated novel carbon nanoneedle field emitters by etching a graphite substrate with Ar or H-2 gases using a radio frequency magnetron sputtering equipment for application to electron-beam-pumped light sources. The field emitter sputtered with H2 gas displays an emission current density of 10 mA/cm(2) at a field of 12 V/mu m and a stability of 6.4% at a field of 11 V/mu m. The authors also demonstrate an electron-beam-pumped light source from the excitation of Ar gas and clearly observe an Ar gas spectrum with a peak at 309 rim. (c) 2007 American Vacuum Society.